Description

Physical Vapor Deposition - Physical Vapor Deposition means Physical Vapour Deposition of Titanium, Titanium Aluminium and Chromium. The process is also referred to as Titanium/Titanium Aluminium/ Chromium by ion plating. The technology behind Physical Vapor Deposition is based upon the principle of plasma acceleration. Physical Vapor Deposition is one of the best methods for enhancing thin film plating elements. The vacuum deposition method coats the product with a film of hard refractory material 1-2 microns thick.

 
Benefits of Physical Vapor Deposition - corrosion and oxidation resistant, environmentally friendly, vandal - resistant, economical, flexible, unique color appearance, versatility, abrasion resistant, long lasting and safety.